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Master of Engineering in Materials Science and Engineering - Advanced Synthesis and Processing

伦斯勒理工学院

Rensselaer Polytechnic Institute

US美国

  • 学历文凭

    学历文凭

    Masters Degree

  • 专业院系

    专业院系

    Materials Science and Engineering

  • 开学时间

    开学时间

  • 课程时长

    课程时长

  • 课程学费

    课程学费

    汇率提示

国际学生入学条件

For admission to graduate study, an applicant must have a U.S. bachelor's degree or the equivalent of a U.S. bachelor's degree prior to enrollment.
Transcripts and Degrees must be in English (all post-secondary education, including transcript keys).
Unofficial transcripts should be uploaded to your graduate application. The minimum requirement for admission consideration is the completion and award of a four year U.S. bachelor's degree, or its equivalent, by the time of planned enrollment.
Personal Statement
Resume or curriculum vitae
Two letters of recommendation
Portfolio, if required by department

TOEFL score of 88 iBT
IELTS score of 6.5
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  • 雅思总分:6.5
  • 托福网考总分:88
  • 托福笔试总分:160
  • 其他语言考试:Duolingo score of 120<br>PTE score of 59

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课程简介

Development and synthesis of new materials, and processing including forming, joining and strengthening of materials and their interfaces, is fundamental to all materials disciplines. MSE faculty at Rensselaer lead research in the design of new materials of all classes, combining disparate materials at tailored interfaces, and in advanced real-time characterization of structure during synthesis and processing. With this range of expertise, an emergent focus in the department is advanced manufacturing that uses data-driven and machine-learning methods to actively control microstructure and precisely target material properties.<br><br>New materials by design require precise synthesis techniques that can control composition, crystal structure as well as microstructure. Research at Rensselaer includes the development of novel techniques for epitaxial growth of crystalline materials that result in extremely low defect concentrations, which are particularly promising for oxide and halide perovskites for opto-electronic applications. Combining sub-wavelength fluorescence imaging with photoresist chemistry may provide a pathway to scalable sub-wavelength optical lithography. Also under investigation are strategies to generate functionality by directed synthesis of bulk materials that are assemblies of nanostructures, and by bringing together dissimilar materials with molecular monolayers that provide adhesion and chemical isolation.
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